The Effect of Boron Content on Wetting Kinetics in Si-B Alloy/h-BN System

Abstract

In this work, the effect of boron content on the high-temperature wetting behavior in the Si-B alloy/h-BN systems was experimentally examined. For this reason, hypoeutectic, eutectic and hypereutectic Si-B alloys (Si-1B, Si-3.2B and Si-5.7B wt.%, respectively) were produced by electric arc melting method and then subjected to sessile drop/contact heating experiments with polycrystalline h-BN substrates, at temperatures up to 1750 °C. Similar to pure Si/h-BN system, wetting kinetics curves calculated on a basis of in situ recorded drop/substrate images point toward non-wetting behavior of all selected Si-B alloy/h-BN couples. The highest contact angle values of ~ 150° were obtained for hypoeutectic and eutectic Si-B alloys in the whole examined temperature range. © 2018, The Author(s).

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Citation
Polkowski, W., Sobczak, N., Bruzda, G., Nowak, R., Giuranno, D., Kudyba, A., et al. (2019). The Effect of Boron Content on Wetting Kinetics in Si-B Alloy/h-BN System (New York, NY : Springer). New York, NY : Springer. https://doi.org//10.1007/s11665-018-3786-8
License
CC BY 4.0 Unported