Towards Oxide Electronics: a Roadmap
dc.bibliographicCitation.firstPage | 1 | eng |
dc.bibliographicCitation.volume | 482 | eng |
dc.contributor.author | Coll, M. | |
dc.contributor.author | Fontcuberta, J. | |
dc.contributor.author | Althammer, M. | |
dc.contributor.author | Bibes, M. | |
dc.contributor.author | Boschker, H. | |
dc.contributor.author | Calleja, A. | |
dc.contributor.author | Cheng, G. | |
dc.contributor.author | Cuoco, M. | |
dc.contributor.author | Dittmann, R. | |
dc.contributor.author | Dkhil, B. | |
dc.contributor.author | El Baggari, I. | |
dc.contributor.author | Fanciulli, M. | |
dc.contributor.author | Fina, I. | |
dc.contributor.author | Fortunato, E. | |
dc.contributor.author | Frontera, C. | |
dc.contributor.author | Fujita, S. | |
dc.contributor.author | Garcia, V. | |
dc.contributor.author | Goennenwein, S.T.B. | |
dc.contributor.author | Granqvist, C.-G. | |
dc.contributor.author | Grollier, J. | |
dc.contributor.author | Gross, R. | |
dc.contributor.author | Hagfeldt, A. | |
dc.contributor.author | Herranz, G. | |
dc.contributor.author | Hono, K. | |
dc.contributor.author | Houwman, E. | |
dc.contributor.author | Huijben, M. | |
dc.contributor.author | Kalaboukhov, A. | |
dc.contributor.author | Keeble, D.J. | |
dc.contributor.author | Koster, G. | |
dc.contributor.author | Kourkoutis, L.F. | |
dc.contributor.author | Levy, J. | |
dc.contributor.author | Lira-Cantu, M. | |
dc.contributor.author | MacManus-Driscoll, J.L. | |
dc.contributor.author | Mannhart, J. | |
dc.contributor.author | Martins, R. | |
dc.contributor.author | Menzel, S. | |
dc.contributor.author | Mikolajick, T. | |
dc.contributor.author | Napari, M. | |
dc.contributor.author | Nguyen, M.D. | |
dc.contributor.author | Niklasson, G. | |
dc.contributor.author | Paillard, C. | |
dc.contributor.author | Panigrahi, S. | |
dc.contributor.author | Rijnders, G. | |
dc.contributor.author | Sánchez, F. | |
dc.contributor.author | Sanchis, P. | |
dc.contributor.author | Sanna, S. | |
dc.contributor.author | Schlom, D.G. | |
dc.contributor.author | Schroeder, U. | |
dc.contributor.author | Shen, K.M. | |
dc.contributor.author | Siemon, A. | |
dc.contributor.author | Spreitzer, M. | |
dc.contributor.author | Sukegawa, H. | |
dc.contributor.author | Tamayo, R. | |
dc.contributor.author | van den Brink, J. | |
dc.contributor.author | Pryds, N. | |
dc.contributor.author | Granozio, F.M. | |
dc.date.accessioned | 2020-07-18T06:12:35Z | |
dc.date.available | 2020-07-18T06:12:35Z | |
dc.date.issued | 2019 | |
dc.description.abstract | [No abstract available] | eng |
dc.description.sponsorship | Leibniz_Fonds | eng |
dc.description.version | publishedVersion | eng |
dc.identifier.uri | https://doi.org/10.34657/3597 | |
dc.identifier.uri | https://oa.tib.eu/renate/handle/123456789/4968 | |
dc.language.iso | eng | eng |
dc.publisher | Amsterdam : Elsevier B.V. | eng |
dc.relation.doi | https://doi.org/10.1016/j.apsusc.2019.03.312 | |
dc.relation.ispartofseries | Applied Surface Science 482 (2019) | eng |
dc.relation.issn | 0169-4332 | |
dc.rights.license | CC BY-NC-ND 4.0 Unported | eng |
dc.rights.uri | https://creativecommons.org/licenses/by-nc-nd/4.0/ | eng |
dc.subject | CMOS | eng |
dc.subject | oxide films | eng |
dc.subject | heterostructures | eng |
dc.subject.ddc | 530 | eng |
dc.title | Towards Oxide Electronics: a Roadmap | eng |
dc.type | article | eng |
dc.type | Text | eng |
dcterms.bibliographicCitation.journalTitle | Applied Surface Science | eng |
tib.accessRights | openAccess | eng |
wgl.contributor | IFWD | eng |
wgl.subject | Physik | eng |
wgl.type | Zeitschriftenartikel | eng |
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