Schottky contacts to In2O3
dc.bibliographicCitation.issue | 4 | eng |
dc.bibliographicCitation.journalTitle | APL Materials | eng |
dc.bibliographicCitation.volume | 2 | |
dc.contributor.author | von Wenckstern, H. | |
dc.contributor.author | Splith, D. | |
dc.contributor.author | Schmidt, F. | |
dc.contributor.author | Grundmann, M. | |
dc.contributor.author | Bierwagen, O. | |
dc.contributor.author | Speck, J.S. | |
dc.date.accessioned | 2019-03-23T00:03:55Z | |
dc.date.available | 2019-06-28T12:39:17Z | |
dc.date.issued | 2014 | |
dc.description.abstract | n-type binary compound semiconductors such as InN, InAs, or In2O3 are especial because the branch-point energy or charge neutrality level lies within the conduction band. Their tendency to form a surface electron accumulation layer prevents the formation of rectifying Schottky contacts. Utilizing a reactive sputtering process in an oxygen-containing atmosphere, we demonstrate Schottky barrier diodes on indium oxide thin films with rectifying properties being sufficient for space charge layer spectroscopy. Conventional non-reactive sputtering resulted in ohmic contacts. We compare the rectification of Pt, Pd, and Au Schottky contacts on In2O3 and discuss temperature-dependent current-voltage characteristics of Pt/In2O3 in detail. The results substantiate the picture of oxygen vacancies being the source of electrons accumulating at the surface, however, the position of the charge neutrality level and/or the prediction of Schottky barrier heights from it are questioned. | |
dc.description.version | publishedVersion | eng |
dc.format | application/pdf | |
dc.identifier.uri | https://doi.org/10.34657/1649 | |
dc.identifier.uri | https://oa.tib.eu/renate/handle/123456789/4232 | |
dc.language.iso | eng | eng |
dc.publisher | New York : American Institute of Physics | |
dc.relation.doi | https://doi.org/10.1063/1.4870536 | |
dc.rights.license | CC BY 3.0 Unported | eng |
dc.rights.uri | https://creativecommons.org/licenses/by/3.0/ | eng |
dc.subject.ddc | 530 | |
dc.subject.other | Ohmic contacts | eng |
dc.subject.other | Schottky contacts | eng |
dc.subject.other | Complex analysis | eng |
dc.subject.other | Sputter | eng |
dc.subject.other | deposition | eng |
dc.subject.other | Transition metals | eng |
dc.subject.other | Thin films | eng |
dc.subject.other | Chemical elements | eng |
dc.subject.other | Electronic bandstructure | eng |
dc.subject.other | Crystallographic defects | eng |
dc.subject.other | Electrostatics | eng |
dc.title | Schottky contacts to In2O3 | |
dc.type | Article | eng |
dc.type | Text | eng |
tib.accessRights | openAccess | eng |
wgl.contributor | PDI | eng |
wgl.subject | Physik | eng |
wgl.type | Zeitschriftenartikel | eng |
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