Integrated sensitive on-chip ion field effect transistors based on wrinkled ingaas nanomembranes

dc.bibliographicCitation.firstPage215eng
dc.bibliographicCitation.issue1eng
dc.bibliographicCitation.journalTitleNanoscale Research Letterseng
dc.bibliographicCitation.lastPage291eng
dc.bibliographicCitation.volume6eng
dc.contributor.authorHarazim, S.M.
dc.contributor.authorFeng, P.
dc.contributor.authorSanchez, S.
dc.contributor.authorDeneke, C.
dc.contributor.authorMei, Y.
dc.contributor.authorSchmidt, O.G.
dc.date.accessioned2020-09-29T09:09:38Z
dc.date.available2020-09-29T09:09:38Z
dc.date.issued2011
dc.description.abstractSelf-organized wrinkling of pre-strained nanomembranes into nanochannels is used to fabricate a fully integrated nanofluidic device for the development of ion field effect transistors (IFETs). Constrained by the structure and shape of the membrane, the deterministic wrinkling process leads to a versatile variation of channel types such as straight two-way channels, three-way branched channels, or even four-way intersection channels. The fabrication of straight channels is well controllable and offers the opportunity to integrate multiple IFET devices into a single chip. Thus, several IFETs are fabricated on a single chip using a III-V semiconductor substrate to control the ion separation and to measure the ion current of a diluted potassium chloride electrolyte solution.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://doi.org/10.34657/4386
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/5757
dc.language.isoengeng
dc.publisherNew York, NY [u.a.] : Springereng
dc.relation.doihttps://doi.org/10.1186/1556-276X-6-215
dc.relation.issn1931-7573
dc.rights.licenseCC BY 2.0 Unportedeng
dc.rights.urihttps://creativecommons.org/licenses/by/2.0/eng
dc.subject.ddc620eng
dc.subject.otherChlorine compoundseng
dc.subject.otherElectrolyteseng
dc.subject.otherIII-V semiconductorseng
dc.subject.otherIonseng
dc.subject.otherNanostructureseng
dc.subject.otherPotasheng
dc.subject.otherPotassium chlorideeng
dc.subject.otherSubstrateseng
dc.subject.otherChlorine compoundseng
dc.subject.otherIonseng
dc.subject.otherNanostructureseng
dc.subject.otherTransistorseng
dc.subject.otherChloride electrolyteseng
dc.subject.otherFully integratedeng
dc.subject.otherIon separationeng
dc.subject.otherNano channelseng
dc.subject.otherNano-fluidic deviceseng
dc.subject.otherNanomembraneseng
dc.subject.otherSemiconductor substrateeng
dc.subject.otherStraight channeleng
dc.subject.otherFully integratedeng
dc.subject.otherII-IV semiconductorseng
dc.subject.otherIon currentseng
dc.subject.otherIon separationeng
dc.subject.otherNano channelseng
dc.subject.otherNano-fluidic deviceseng
dc.subject.otherNanomembraneseng
dc.subject.otherOn chipseng
dc.subject.otherPotassium chlorideeng
dc.subject.otherSingle chipseng
dc.subject.otherStraight channeleng
dc.subject.otherField effect transistorseng
dc.subject.otherField effect transistorseng
dc.titleIntegrated sensitive on-chip ion field effect transistors based on wrinkled ingaas nanomembraneseng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccesseng
wgl.contributorIFWDeng
wgl.subjectIngenieurwissenschafteneng
wgl.typeZeitschriftenartikeleng
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