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Author: Jenichen, B. × DDC: 620 ×

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    Molecular beam epitaxy of graphene on ultra-smooth nickel: growth mode and substrate interactions
    (London : Institute of Physics, 2014) Wofford, J.M.; Oliveira Jr, M.H.; Schumann, T.; Jenichen, B.; Ramsteiner, M.; Jahn, U.; Fölsch, S.; Lopes, J.M.J.; Riechert, H.
    Graphene is grown by molecular beam epitaxy using epitaxial Ni films on MgO(111) as substrates. Raman spectroscopy and scanning tunneling microscopy reveal the graphene films to have few crystalline defects. While the layers are ultra-smooth over large areas, we find that Ni surface features lead to local non-uniformly thick graphene inclusions. The influence of the Ni surface structure on the position and morphology of these inclusions strongly suggests that multilayer graphene on Ni forms at the interface of the first complete layer and metal substrate in a growth-from-below mechanism. The interplay between Ni surface features and graphene growth behavior may facilitate the production of films with spatially resolved multilayer inclusions through engineered substrate surface morphology.
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    Lattice matched Volmer–Weber growth of Fe3Si on GaAs(001) - the influence of the growth rate
    (Bristol : IOP Publ., 2019) Jenichen, B.; Cheng, Z.; Hanke, M.; Herfort, J.; Trampert, A.
    We investigate the formation of lattice matched single-crystalline Fe3Si/GaAs(001) ferromagnet/semiconductor hybrid structures by Volmer-Weber island growth, starting from the epitaxial growth of isolated Fe3Si islands up to the formation of continuous films as a result of island coalescence. We find coherent defect-free layers exhibiting compositional disorder near the Fe3Si/GaAs - interface for higher growth rates, whereas they are fully ordered for lower growth rates. © 2019 IOP Publishing Ltd.