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    Deposition of exchange-coupled dinickel complexes on gold substrates utilizing ambidentate mercapto-carboxylato ligands
    (Frankfurt, M. : Beilstein-Institut zur Förderung der Chemischen Wissenschaften, 2017) Börner, Martin; Blömer, Laura; Kischel, Marcus; Richter, Peter; Salvan, Georgeta; Zahn, Dietrich R. T.; Siles, Pablo F.; Fuentes, Maria E. N.; Bufon, Carlos C. B.; Grimm, Daniel; Schmidt, Oliver G.; Breite, Daniel; Abel, Bernd; Kersting, Berthold
    The chemisorption of magnetically bistable transition metal complexes on planar surfaces has recently attracted increased scientific interest due to its potential application in various fields, including molecular spintronics. In this work, the synthesis of mixed-ligand complexes of the type [NiII2L(L’)](ClO4), where L represents a 24-membered macrocyclic hexaazadithiophenolate ligand and L’ is a ω-mercapto-carboxylato ligand (L’ = HS(CH2)5CO2− (6), HS(CH2)10CO2− (7), or HS(C6H4)2CO2− (8)), and their ability to adsorb on gold surfaces is reported. Besides elemental analysis, IR spectroscopy, electrospray ionization mass spectrometry (ESIMS), UV–vis spectroscopy, and X-ray crystallography (for 6 and 7), the compounds were also studied by temperature-dependent magnetic susceptibility measurements (for 7 and 8) and (broken symmetry) density functional theory (DFT) calculations. An S = 2 ground state is demonstrated by temperature-dependent susceptibility and magnetization measurements, achieved by ferromagnetic coupling between the spins of the Ni(II) ions in 7 (J = +22.3 cm−1) and 8 (J = +20.8 cm−1; H = −2JS1S2). The reactivity of complexes 6–8 is reminiscent of that of pure thiolato ligands, which readily chemisorb on Au surfaces as verified by contact angle, atomic force microscopy (AFM) and spectroscopic ellipsometry measurements. The large [Ni2L] tail groups, however, prevent the packing and self-assembly of the hydrocarbon chains. The smaller film thickness of 7 is attributed to the specific coordination mode of the coligand. Results of preliminary transport measurements utilizing rolled-up devices are also reported.
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    Topography evolution of germanium thin films synthesized by pulsed laser deposition
    (New York, NY : American Inst. of Physics, 2017) Schumacher, P.; Mayr, S.G.; Rauschenbach, B.
    Germanium thin films were deposited by Pulsed Laser Deposition (PLD) onto single crystal Ge (100) and Si (100) substrates with a native oxide film on the surface. The topography of the surface was investigated by Atomic Force Microscopy (AFM) to evaluate the scaling behavior of the surface roughness of amorphous and polycrystalline Ge films grown on substrates with different roughnesses. Roughness evolution was interpreted within the framework of stochastic rate equations for thin film growth. Here the Kardar-Parisi-Zhang equation was used to describe the smoothening process. Additionally, a roughening regime was observed in which 3-dimensional growth occurred. Diffusion of the deposited Ge adatoms controlled the growth of the amorphous Ge thin films. The growth of polycrystalline thin Ge films was dominated by diffusion processes only in the initial stage of the growth.
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    Human health risk evaluation of a microwave-driven atmospheric plasma jet as medical device
    (Amsterdam [u.a.] : Elsevier, 2017) Lehmann, A.; Pietag, F.; Arnold, T.
    Purpose: The aim of this study was the characterisation of a microwave-driven atmospheric plasma jet (APJ) dedicated for medical applications. The scientific focus includes harmless sterilization of surfaces and therapeutic treatments in dentistry. Methodes: The plasma was investigated with respect to potential health risks for human beings, which could occur especially by the gas temperature, heat flow, patient leakage current, UV emission and ozone emission from the plasma jet, according to DIN SPEC 91315:2014-06 (General requirements for plasma sources in medicine) [1]. Results: The results of the experiments indicate a high potential of the plasma jet to be used as a medical device exhibiting low gas temperatures up to 34 °C. The calculated leakage currents are mostly below the 10 μA threshold. The limiting UV exposure duration for the APJ with a calculated maximum effective irradiance of 2.6 μW/cm2 is around 19 min, based on the exposure limits of the international commission on non-ionizing radiation protection guidelines (ICNIRP) [2]. A significant ozone concentration was observed mainly in the axial effluent gas flow. Ozone concentration strongly decreases with increasing distance from the plasma source exit nozzle. Conclusion: The investigated APJ exhibits physical properties that might not constitute health risks to humans, e.g. during treatment in dentistry. Thus, the APJ shows a high potential for application as a device in dental therapy.
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    Characteristics of diamond turned NiP smoothed with ion beam planarization technique
    (London : [Springer], 2017) Li, Yaguo; Takino, Hideo; Frost, Frank
    Background: Diamond turning is widely used in machining metals and semiconductors but the turning marks are incurred on machined components due to the mechanics of the technology. The marks are generally harmful to the systems comprising of the machined components. Therefore, the capability of ion beam planarization (IBP) to reduce turning marks of diamond turned metal surfaces was investigated using NiP as an example. Methods: The turning marks and thereby roughness was reduced by IBP with respect to different spatial wavelengths and amplitudes of turning marks. Different thickness of coating resist was also examined in order to find out the potential effects of resist thickness on the reduction of turning marks and roughness. Additionally, the effect of multiple planarization steps was also analyzed. Results: The spatial wavelength and depth of turning marks have only minor impact on the degree of surface roughness reduction. Thicker coating tends to achieve smoother surface after coating turned NiP while ion beam etching can keep surface roughness almost unchanged in our experiments. The surface roughness of diamond turned NiP drops exponentially with processing steps under experimented conditions. Using up to five IBP steps, the surface roughness can be reduced up to one order of magnitude (from Rq ~ 6.5 nm to Rq ~ 0.7 nm). Conclusions: IBP technique performs very well in reducing turning marks on diamond turned NiP surfaces. The surface roughness can be further improved by optimizing the properties of planarizing resist layer and coating processes to enhance the IBP technique as a final surface finishing technology.
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    Ion Beam Assisted Deposition of Thin Epitaxial GaN Films
    (Basel : MDPI, 2017-6-23) Rauschenbach, Bernd; Lotnyk, Andriy; Neumann, Lena; Poppitz, David; Gerlach, Jürgen W.
    The assistance of thin film deposition with low-energy ion bombardment influences their final properties significantly. Especially, the application of so-called hyperthermal ions (energy <100 eV) is capable to modify the characteristics of the growing film without generating a large number of irradiation induced defects. The nitrogen ion beam assisted molecular beam epitaxy (ion energy <25 eV) is used to deposit GaN thin films on (0001)-oriented 6H-SiC substrates at 700 °C. The films are studied in situ by reflection high energy electron diffraction, ex situ by X-ray diffraction, scanning tunnelling microscopy, and high-resolution transmission electron microscopy. It is demonstrated that the film growth mode can be controlled by varying the ion to atom ratio, where 2D films are characterized by a smooth topography, a high crystalline quality, low biaxial stress, and low defect density. Typical structural defects in the GaN thin films were identified as basal plane stacking faults, low-angle grain boundaries forming between w-GaN and z-GaN and twin boundaries. The misfit strain between the GaN thin films and substrates is relieved by the generation of edge dislocations in the first and second monolayers of GaN thin films and of misfit interfacial dislocations. It can be demonstrated that the low-energy nitrogen ion assisted molecular beam epitaxy is a technique to produce thin GaN films of high crystalline quality.
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    Evidence for Efficient Pathway to Produce Slow Electrons by Ground-state Dication in Clusters
    (Bristol : IOP Publ., 2017) You, Daehyun; Fukuzawa, Hironobu; Sakakibara, Yuta; Takanashi, Tsukasa; Ito, Yuta; Maliyar, Gianluigi G.; Motomura, Koji; Nagaya, Kiyonobu; Nishiyama, Toshiyuki; Asa, Kazuki; Sato, Yuhiro; Saito, Norio; Oura, Masaki; Schöffler, Markus; Kastirke, Gregor; Hergenhahn, Uwe; Stumpf, Vasili; Gohkberg, Kirill; Kuleff, Alexander I.; Cederbaum, Lorenz S.; Ueda, Kiyoshi
    We present an experimental evidence for a so-far unobserved, but potentially very important step relaxation cascades following inner-shell ionization of a composite system: Multiply charged ionic states created after Auger decay may be neutralized by electron transfer from a neighboring species, producing at the same time a low-energy free electron. This electron transfer-mediated decay (ETMD) called process is effective even after Auger decay into the dicationic ground state. Here, we report the ETMD of Ne2+ produced after Ne 1s photoionization in Ne-Kr mixed clusters.
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    Reactive ion beam figuring of optical aluminium surfaces
    (Bristol : IOP Publ., 2017) Bauer, Jens; Frost, Frank; Arnold, Thomas
    Ultra-smooth and arbitrarily shaped reflective optics are necessary for further progress in EUV/XUV lithography, x-ray and synchrotron technology. As one of the most important technological mirror optic materials, aluminium behaves in a rather difficult way in ultra-precision machining with such standard techniques as diamond-turning and subsequent ion beam figuring (IBF). In particular, in the latter, a strong surface roughening is obtained. Hence, up to now it has not been possible to attain the surface qualities required for UV or just visible spectral range applications. To overcome the limitations mainly caused by the aluminium alloy structural and compositional conditions, a reactive ion beam machining process using oxygen process gas is evaluated. To clarify the principle differences in the effect of oxygen gas contrary to oxygen ions on aluminium surface machining, we firstly focus on chemical-assisted ion beam etching (CAIBE) and reactive ion beam etching (RIBE) experiments in a phenomenological manner. Then, the optimum process route will be explored within a more quantitative analysis applying the concept of power spectral density (PSD) for a sophisticated treatment of the surface topography. Eventually, the surface composition is examined by means of dynamic secondary ion mass spectrometry (SIMS) suggesting a characteristic model scheme for the chemical modification of the aluminium surface during oxygen ion beam machining. Monte Carlo simulations were applied to achieve a more detailed process conception.
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    Charge transfer to ground-state ions produces free electrons
    ([London] : Nature Publishing Group UK, 2017) You, D.; Fukuzawa, H.; Sakakibara, Y.; Takanashi, T.; Ito, Y.; Maliyar, G G.; Motomura, K.; Nagaya, K.; Nishiyama, T.; Asa, K.; Sato, Y.; Saito, N.; Oura, M.; Schöffler, M.; Kastirke, G.; Hergenhahn, U.; Stumpf, V.; Gokhberg, K.; Kuleff, A.I.; Cederbaum, L.S.; Ueda, K
    Inner-shell ionization of an isolated atom typically leads to Auger decay. In an environment, for example, a liquid or a van der Waals bonded system, this process will be modified, and becomes part of a complex cascade of relaxation steps. Understanding these steps is important, as they determine the production of slow electrons and singly charged radicals, the most abundant products in radiation chemistry. In this communication, we present experimental evidence for a so-far unobserved, but potentially very important step in such relaxation cascades: Multiply charged ionic states after Auger decay may partially be neutralized by electron transfer, simultaneously evoking the creation of a low-energy free electron (electron transfer-mediated decay). This process is effective even after Auger decay into the dicationic ground state. In our experiment, we observe the decay of Ne2+ produced after Ne 1s photoionization in Ne-Kr mixed clusters.
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    Advanced Electric Propulsion Diagnostic Tools at IOM
    (Amsterdam [u.a.] : Elsevier, 2017) Bundesmann, C.; Eichhorn, C.; Scholze, F.; Spemann, D.; Neumann, H.; Scortecci, F.; Leiter, H.J.; Holste, K.; Klar, P.J.; Bulit, A.; Dannenmayer, K.; Amo, J. Gonzalez del
    Recently, we have set up an Advanced Electric Propulsion Diagnostic (AEPD) platform [1], which allows for the in-situ measurement of a comprehensive set of thruster performance parameters. The platform utilizes a five-axis-movement system for precise positioning of the thruster with respect to the diagnostic heads. In the first setup (AEPD1) an energy-selective mass spectrometer (ESMS) and a miniaturized Faraday probe for ion beam characterization, a telemicroscope and a triangular laser head for measuring the erosion of mechanical parts, and a pyrometer for surface temperature measurements were integrated. The capabilities of the AEPD1 platform were demonstrated with two electric propulsion thrusters, a gridded ion thruster RIT 22 (Airbus Defence & Space, Germany, [13]) and a Hall effect thruster SPT 100D EM1 (EDB Fakel, Russia, [1], [4]), in two different vacuum facilities.
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    Nanoscale patterning of self-assembled monolayer (SAM)-functionalised substrates with single molecule contact printing
    (Cambridge : RSC Publ., 2017) Sajfutdinow, M.; Uhlig, K.; Prager, A.; Schneider, C.; Abel, B.; Smith, D.M.
    Defined arrangements of individual molecules are covalenty connected ("printed") onto SAM-functionalised gold substrates with nanometer resolution. Substrates were initially pre-functionlised by coating with 3,3′-dithiodipropionic acid (DTPA) to form a self-assembled monolayer (SAM), which was characterised by atomic force microscopy (AFM), contact angle goniometry, cyclic voltammetry and surface plasmon resonance (SPR) spectroscopy. Pre-defined "ink" patterns displayed on DNA origami-based single-use carriers ("stamp") were covalently conjugated to the SAM using 1-ethyl-3-(3-dimethylamino-propyl)carbodiimide (EDC) and N-hydroxy-succinimide (NHS). These anchor points were used to create nanometer-precise single-molecule arrays, here with complementary DNA and streptavidin. Sequential steps of the printing process were evaluated by AFM and SPR spectroscopy. It was shown that 30% of the detected arrangements closely match the expected length distribution of designed patterns, whereas another 40% exhibit error within the range of only 1 streptavidin molecule. SPR results indicate that imposing a defined separation between molecular anchor points within the pattern through this printing process enhances the efficiency for association of specific binding partners for systems with high sterical hindrance. This study expands upon earlier findings where geometrical information was conserved by the application of DNA nanostructures, by establishing a generalisable strategy which is universally applicable to nearly any type of prefunctionalised substrate such as metals, plastics, silicates, ITO or 2D materials.