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Title: Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy
Authors: Paik, HanjongChen, ZhenLochocki, EdwardSeidner H., ArielVerma, AmitTanen, NicholasPark, JisungUchida, MasakiShang, ShunLiZhou, Bi-ChengBrützam, MarioUecker, ReinhardLiu, Zi-KuiJena, DebdeepShen, Kyle M.Muller, David A.Schlom, Darrell G.
Publishers version: https://doi.org/10.1063/1.5001839
URI: https://oa.tib.eu/renate/handle/123456789/11664
http://dx.doi.org/10.34657/10697
Issue Date: 2017
Published in: APL Materials 5 (2017), Nr. 11
Journal: APL Materials
Volume: 5
Issue: 11
Page Start: 116107
Publisher: Melville, NY : AIP Publ.
Abstract: Epitaxial La-doped BaSnO3 films were grown in an adsorption-controlled regime by molecular-beam epitaxy, where the excess volatile SnOx desorbs from the film surface. A film grown on a (001) DyScO3 substrate exhibited a mobility of 183 cm2 V-1 s-1 at room temperature and 400 cm2 V-1 s-1 at 10 K despite the high concentration (1.2 × 1011 cm-2) of threading dislocations present. In comparison to other reports, we observe a much lower concentration of (BaO)2 Ruddlesden-Popper crystallographic shear faults. This suggests that in addition to threading dislocations, other defects - possibly (BaO)2 crystallographic shear defects or point defects - significantly reduce the electron mobility.
Keywords: Dysprosium compounds; Epitaxial growth; Lanthanum compounds; Molecular beam epitaxy; Molecular beams; Point defects; Scandium compounds; Single crystals; Tin compounds
Type: article; Text
Publishing status: publishedVersion
DDC: 620
600
License: CC BY 4.0 Unported
Link to license: https://creativecommons.org/licenses/by/4.0/
Appears in Collections:Ingenieurwissenschaften

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Paik, Hanjong, Zhen Chen, Edward Lochocki, Ariel Seidner H., Amit Verma, Nicholas Tanen, Jisung Park, Masaki Uchida, ShunLi Shang, Bi-Cheng Zhou, Mario Brützam, Reinhard Uecker, Zi-Kui Liu, Debdeep Jena, Kyle M. Shen, David A. Muller and Darrell G. Schlom, 2017. Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy. 2017. Melville, NY : AIP Publ.
Paik, H., Chen, Z., Lochocki, E., Seidner H., A., Verma, A., Tanen, N., Park, J., Uchida, M., Shang, S., Zhou, B.-C., Brützam, M., Uecker, R., Liu, Z.-K., Jena, D., Shen, K. M., Muller, D. A. and Schlom, D. G. (2017) “Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy.” Melville, NY : AIP Publ. doi: https://doi.org/10.1063/1.5001839.
Paik H, Chen Z, Lochocki E, Seidner H. A, Verma A, Tanen N, Park J, Uchida M, Shang S, Zhou B-C, Brützam M, Uecker R, Liu Z-K, Jena D, Shen K M, Muller D A, Schlom D G. Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy. Vol. 5. Melville, NY : AIP Publ.; 2017.
Paik, H., Chen, Z., Lochocki, E., Seidner H., A., Verma, A., Tanen, N., Park, J., Uchida, M., Shang, S., Zhou, B.-C., Brützam, M., Uecker, R., Liu, Z.-K., Jena, D., Shen, K. M., Muller, D. A., & Schlom, D. G. (2017). Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy (Version publishedVersion, Vol. 5). Version publishedVersion, Vol. 5. Melville, NY : AIP Publ. https://doi.org/https://doi.org/10.1063/1.5001839
Paik H, Chen Z, Lochocki E, Seidner H. A, Verma A, Tanen N, Park J, Uchida M, Shang S, Zhou B-C, Brützam M, Uecker R, Liu Z-K, Jena D, Shen K M, Muller D A, Schlom D G. Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy. 2017;5(11). doi:https://doi.org/10.1063/1.5001839


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