Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy

Abstract

Epitaxial La-doped BaSnO3 films were grown in an adsorption-controlled regime by molecular-beam epitaxy, where the excess volatile SnOx desorbs from the film surface. A film grown on a (001) DyScO3 substrate exhibited a mobility of 183 cm2 V-1 s-1 at room temperature and 400 cm2 V-1 s-1 at 10 K despite the high concentration (1.2 × 1011 cm-2) of threading dislocations present. In comparison to other reports, we observe a much lower concentration of (BaO)2 Ruddlesden-Popper crystallographic shear faults. This suggests that in addition to threading dislocations, other defects - possibly (BaO)2 crystallographic shear defects or point defects - significantly reduce the electron mobility.

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Citation
Paik, H., Chen, Z., Lochocki, E., Seidner H., A., Verma, A., Tanen, N., et al. (2017). Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy (Melville, NY : AIP Publ.). Melville, NY : AIP Publ. https://doi.org//10.1063/1.5001839
License
CC BY 4.0 Unported