Incorporation of nitrogen into TiO2 thin films during PVD processes

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Bristol : Institute of Physics Publishing

In this paper we investigate the possibility of incorporating nitrogen into amorphous, photocatalytic TiO2 thin films, prepared at room temperature, during the growth process. The aim is to reduce the bandgap of the UV active thin films. Physical vapor deposition experiments employing a titanium vacuum arc with gas backfill ranging from pure oxygen to pure nitrogen, are carried out. The resulting films are characterized for chemical composition, phase composition, optical properties and hydrophilicity in order to determine a correlation between gas composition and thin film properties. The experimental results point that a visible change in the band structure of the deposited layers is achieved.

Amorphous films, Condensed matter physics, Metals, Nitrogen, Optical correlation, Optical properties, Oxide films, Physical vapor deposition, Titanium dioxide, Transition metal compounds, Transition metals, Vacuum applications, Vapor deposition, Chemical compositions, Deposited layer, Gas compositions, Growth process, Photo-catalytic, Pure oxygen, Thin-film properties, Vacuum arcs, Thin films
Asenova, I., Manova, D., & Mändl, S. (2014). Incorporation of nitrogen into TiO2 thin films during PVD processes (Version publishedVersion, Vol. 559). Version publishedVersion, Vol. 559. Bristol : Institute of Physics Publishing.