Chemical surface and thin film analysis in glass coating

dc.bibliographicCitation.firstPage340
dc.bibliographicCitation.journalTitleGlass Science and Technologyeng
dc.bibliographicCitation.lastPage353
dc.bibliographicCitation.volume70
dc.contributor.authorOechsner, Hans
dc.date.accessioned2024-01-08T07:53:11Z
dc.date.available2024-01-08T07:53:11Z
dc.date.issued1997
dc.description.abstractAfter a short overview of recent analytical techniques for compositional surface analysis and the determination of concentration depth profiles, the principle, the Instrumentation and the Performance of the routinely used electron spectroscopic and mass spectrometric methods, namely photo- and Auger electron spectroscopy as well as secondary ion and secondary neutral mass spectrometry, are described. The application of these techniques to electrically insulating surfaces and layer structures is particularly emphasized by corresponding practical examples. Secondary neutral mass spectrometry is specifically addressed with regard to the potentialities of the novel high-frequency mo d e of electron-gas secondary neutral mass spectrometry for quantitative composition analysis and high-resolution depth profiling of electrically nonconducting sample structures.eng
dc.description.versionpublishedVersion
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/14241
dc.identifier.urihttps://doi.org/10.34657/13271
dc.language.isoeng
dc.publisherOffenbach : Verlag der Deutschen Glastechnischen Gesellschaft
dc.relation.issn0946-7475
dc.rights.licenseCC BY 3.0 DE
dc.rights.urihttps://creativecommons.org/licenses/by/3.0/de/
dc.subject.ddc660
dc.titleChemical surface and thin film analysis in glass coatingeng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccess
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