Influence of diluted acid mixtures on selective etching of MHz- and kHz-fs-laser inscribed structures in YAG
dc.bibliographicCitation.firstPage | 1546 | eng |
dc.bibliographicCitation.issue | 5 | eng |
dc.bibliographicCitation.lastPage | 1554 | eng |
dc.bibliographicCitation.volume | 11 | eng |
dc.contributor.author | Hasse, Kore | |
dc.contributor.author | Kip, Detlef | |
dc.contributor.author | Kränkel, Christian | |
dc.date.accessioned | 2022-04-01T06:46:58Z | |
dc.date.available | 2022-04-01T06:46:58Z | |
dc.date.issued | 2021 | |
dc.description.abstract | We show that the inscription velocity of fs-laser written structures in YAG crystals can be significantly improved by the use of MHz repetition rates for the writing process. Using a 10 MHz inscription laser, record high writing velocities up to 100 mm/s are achieved. Also, the selective etching process is accelerated using a diluted mixture of 22% H3PO4 and 24% H2SO4. The diluted mixture enables selective etching of up to 9.6 mm long, 1 µm wide and 18 µm high microchannels in 23 days. The etching parameter D of 11.2 µm2/s is a factor of 3 higher than previously reported and the selectivity is even increased by an order of magnitude. | eng |
dc.description.version | publishedVersion | eng |
dc.identifier.uri | https://oa.tib.eu/renate/handle/123456789/8536 | |
dc.identifier.uri | https://doi.org/10.34657/7574 | |
dc.language.iso | eng | eng |
dc.publisher | Washington, DC : OSA | eng |
dc.relation.doi | https://doi.org/10.1364/OME.423931 | |
dc.relation.essn | 2159-3930 | |
dc.relation.ispartofseries | Optical materials express 11 (2021), Nr. 5 | eng |
dc.rights.license | OSA Open Access Publishing Agreement | eng |
dc.rights.uri | https://www.osapublishing.org/library/license_v1.cfm | eng |
dc.subject | Mixtures | eng |
dc.subject | Sulfuric acid | eng |
dc.subject | Yttrium aluminum garnet | eng |
dc.subject | Acid mixtures | eng |
dc.subject | Etching parameters | eng |
dc.subject | Fs laser | eng |
dc.subject | Optical Society of America | eng |
dc.subject | Repetition rate | eng |
dc.subject | Selective etching | eng |
dc.subject.ddc | 620 | eng |
dc.title | Influence of diluted acid mixtures on selective etching of MHz- and kHz-fs-laser inscribed structures in YAG | eng |
dc.type | article | eng |
dc.type | Text | eng |
dcterms.bibliographicCitation.journalTitle | Optical materials express | eng |
tib.accessRights | openAccess | eng |
wgl.contributor | IKZ | eng |
wgl.subject | Ingenieurwissenschaften | eng |
wgl.type | Zeitschriftenartikel | eng |
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