Influence of diluted acid mixtures on selective etching of MHz- and kHz-fs-laser inscribed structures in YAG

dc.bibliographicCitation.firstPage1546eng
dc.bibliographicCitation.issue5eng
dc.bibliographicCitation.lastPage1554eng
dc.bibliographicCitation.volume11eng
dc.contributor.authorHasse, Kore
dc.contributor.authorKip, Detlef
dc.contributor.authorKränkel, Christian
dc.date.accessioned2022-04-01T06:46:58Z
dc.date.available2022-04-01T06:46:58Z
dc.date.issued2021
dc.description.abstractWe show that the inscription velocity of fs-laser written structures in YAG crystals can be significantly improved by the use of MHz repetition rates for the writing process. Using a 10 MHz inscription laser, record high writing velocities up to 100 mm/s are achieved. Also, the selective etching process is accelerated using a diluted mixture of 22% H3PO4 and 24% H2SO4. The diluted mixture enables selective etching of up to 9.6 mm long, 1 µm wide and 18 µm high microchannels in 23 days. The etching parameter D of 11.2 µm2/s is a factor of 3 higher than previously reported and the selectivity is even increased by an order of magnitude.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/8536
dc.identifier.urihttps://doi.org/10.34657/7574
dc.language.isoengeng
dc.publisherWashington, DC : OSAeng
dc.relation.doihttps://doi.org/10.1364/OME.423931
dc.relation.essn2159-3930
dc.relation.ispartofseriesOptical materials express 11 (2021), Nr. 5eng
dc.rights.licenseOSA Open Access Publishing Agreementeng
dc.rights.urihttps://www.osapublishing.org/library/license_v1.cfmeng
dc.subjectMixtureseng
dc.subjectSulfuric acideng
dc.subjectYttrium aluminum garneteng
dc.subjectAcid mixtureseng
dc.subjectEtching parameterseng
dc.subjectFs lasereng
dc.subjectOptical Society of Americaeng
dc.subjectRepetition rateeng
dc.subjectSelective etchingeng
dc.subject.ddc620eng
dc.titleInfluence of diluted acid mixtures on selective etching of MHz- and kHz-fs-laser inscribed structures in YAGeng
dc.typearticleeng
dc.typeTexteng
dcterms.bibliographicCitation.journalTitleOptical materials expresseng
tib.accessRightsopenAccesseng
wgl.contributorIKZeng
wgl.subjectIngenieurwissenschafteneng
wgl.typeZeitschriftenartikeleng
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