Nanoscale friction on MoS2/graphene heterostructures

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Date
2023
Volume
15
Issue
12
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Publisher
Cambridge : RSC Publ.
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Abstract

Stacked hetero-structures of two-dimensional materials allow for a design of interactions with corresponding electronic and mechanical properties. We report structure, work function, and frictional properties of 1 to 4 layers of MoS2 grown by chemical vapor deposition on epitaxial graphene on SiC(0001). Experiments were performed by atomic force microscopy in ultra-high vacuum. Friction is dominated by adhesion which is mediated by a deformation of the layers to adapt the shape of the tip apex. Friction decreases with increasing number of MoS2 layers as the bending rigidity leads to less deformation. The dependence of friction on applied load and bias voltage can be attributed to variations in the atomic potential corrugation of the interface, which is enhanced by both load and applied bias. Minimal friction is obtained when work function differences are compensated.

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Keywords
Chemical vapor deposition, Graphene, Layered semiconductors, Molybdenum compounds, Silicon carbide, Sulfur compounds, Work function, Applied bias, Atomic-force-microscopy, Bending rigidity, Chemical vapour deposition, Epitaxial graphene, Frictional properties, Function properties, Nanoscale friction, Tip apex, Two-dimensional materials, Friction
Citation
Liu, Z., Szczefanowicz, B., Lopes, J. M. J., Gan, Z., George, A., Turchanin, A., & Bennewitz, R. (2023). Nanoscale friction on MoS2/graphene heterostructures (Cambridge : RSC Publ.). Cambridge : RSC Publ. https://doi.org//10.1039/d3nr00138e
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CC BY-NC 3.0 Unported