Nanoscale friction on MoS2/graphene heterostructures

dc.bibliographicCitation.firstPage5809
dc.bibliographicCitation.issue12
dc.bibliographicCitation.lastPage5815
dc.bibliographicCitation.volume15
dc.contributor.authorLiu, Zhao
dc.contributor.authorSzczefanowicz, Bartosz
dc.contributor.authorLopes, J. Marcelo J.
dc.contributor.authorGan, Ziyang
dc.contributor.authorGeorge, Antony
dc.contributor.authorTurchanin, Andrey
dc.contributor.authorBennewitz, Roland
dc.date.accessioned2024-07-02T07:17:02Z
dc.date.available2024-07-02T07:17:02Z
dc.date.issued2023
dc.description.abstractStacked hetero-structures of two-dimensional materials allow for a design of interactions with corresponding electronic and mechanical properties. We report structure, work function, and frictional properties of 1 to 4 layers of MoS2 grown by chemical vapor deposition on epitaxial graphene on SiC(0001). Experiments were performed by atomic force microscopy in ultra-high vacuum. Friction is dominated by adhesion which is mediated by a deformation of the layers to adapt the shape of the tip apex. Friction decreases with increasing number of MoS2 layers as the bending rigidity leads to less deformation. The dependence of friction on applied load and bias voltage can be attributed to variations in the atomic potential corrugation of the interface, which is enhanced by both load and applied bias. Minimal friction is obtained when work function differences are compensated.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/14756
dc.identifier.urihttps://doi.org/10.34657/13778
dc.language.isoeng
dc.publisherCambridge : RSC Publ.
dc.relation.doihttps://doi.org/10.1039/d3nr00138e
dc.relation.essn2040-3372
dc.relation.ispartofseriesNanoscale 15 (2023), Nr. 12
dc.relation.issn2040-3364
dc.rights.licenseCC BY-NC 3.0 Unported
dc.rights.urihttps://creativecommons.org/licenses/by-nc/3.0
dc.subjectChemical vapor depositioneng
dc.subjectGrapheneeng
dc.subjectLayered semiconductorseng
dc.subjectMolybdenum compoundseng
dc.subjectSilicon carbideeng
dc.subjectSulfur compoundseng
dc.subjectWork functioneng
dc.subjectApplied biaseng
dc.subjectAtomic-force-microscopyeng
dc.subjectBending rigidityeng
dc.subjectChemical vapour depositioneng
dc.subjectEpitaxial grapheneeng
dc.subjectFrictional propertieseng
dc.subjectFunction propertieseng
dc.subjectNanoscale frictioneng
dc.subjectTip apexeng
dc.subjectTwo-dimensional materialseng
dc.subjectFrictioneng
dc.subject.ddc600
dc.titleNanoscale friction on MoS2/graphene heterostructureseng
dc.typeArticle
dc.typeText
dcterms.bibliographicCitation.journalTitleNanoscale
tib.accessRightsopenAccess
wgl.contributorINM
wgl.subjectChemieger
wgl.typeZeitschriftenartikelger
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