Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

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dc.bibliographicCitation.firstPage17222
dc.bibliographicCitation.journalTitleScientific reportseng
dc.bibliographicCitation.volume11
dc.contributor.authorLukose, R.
dc.contributor.authorLisker, M.
dc.contributor.authorAkhtar, F.
dc.contributor.authorFraschke, M.
dc.contributor.authorGrabolla, T.
dc.contributor.authorMai, A.
dc.contributor.authorLukosius, M.
dc.date.accessioned2023-03-30T05:20:38Z
dc.date.available2023-03-30T05:20:38Z
dc.date.issued2021
dc.description.abstractThe original version of this Article omitted an affiliation for M. Lisker. The correct affiliations for M. Lisker are listed below: IHP- Leibniz Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236, Frankfurt (Oder), Germany Technical University of Applied Science Wildau, Hochschulring 1, 15745, Wildau, Germany The original Article and accompanying Supplementary Information file have been corrected.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/11809
dc.identifier.urihttp://dx.doi.org/10.34657/10842
dc.language.isoeng
dc.publisher[London] : Macmillan Publishers Limited, part of Springer Nature
dc.relation.doihttps://doi.org/10.1038/s41598-021-96605-z
dc.relation.essn2045-2322
dc.rights.licenseCC BY 4.0 Unported
dc.rights.urihttps://creativecommons.org/licenses/by/4.0
dc.subject.ddc500
dc.subject.ddc600
dc.titleAuthor Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of grapheneeng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccess
wgl.contributorIHP
wgl.subjectPhysikger
wgl.subjectIngenieurwissenschaftenger
wgl.typeZeitschriftenartikelger
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