Optoelectronic properties and ultrafast carrier dynamics of copper iodide thin films

dc.bibliographicCitation.firstPage6346
dc.bibliographicCitation.issue1
dc.bibliographicCitation.journalTitleNature Communicationseng
dc.bibliographicCitation.volume13
dc.contributor.authorLi, Zhan Hua
dc.contributor.authorHe, Jia Xing
dc.contributor.authorLv, Xiao Hu
dc.contributor.authorChi, Ling Fei
dc.contributor.authorEgbo, Kingsley O.
dc.contributor.authorLi, Ming-De
dc.contributor.authorTanaka, Tooru
dc.contributor.authorGuo, Qi Xin
dc.contributor.authorYu, Kin Man
dc.contributor.authorLiu, Chao Ping
dc.date.accessioned2023-02-10T09:22:55Z
dc.date.available2023-02-10T09:22:55Z
dc.date.issued2022
dc.description.abstractAs a promising high mobility p-type wide bandgap semiconductor, copper iodide has received increasing attention in recent years. However, the defect physics/evolution are still controversial, and particularly the ultrafast carrier and exciton dynamics in copper iodide has rarely been investigated. Here, we study these fundamental properties for copper iodide thin films by a synergistic approach employing a combination of analytical techniques. Steady-state photoluminescence spectra reveal that the emission at ~420 nm arises from the recombination of electrons with neutral copper vacancies. The photogenerated carrier density dependent ultrafast physical processes are elucidated with using the femtosecond transient absorption spectroscopy. Both the effects of hot-phonon bottleneck and the Auger heating significantly slow down the cooling rate of hot-carriers in the case of high excitation density. The effect of defects on the carrier recombination and the two-photon induced ultrafast carrier dynamics are also investigated. These findings are crucial to the optoelectronic applications of copper iodide.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/11408
dc.identifier.urihttp://dx.doi.org/10.34657/10442
dc.language.isoeng
dc.publisher[London] : Nature Publishing Group UK
dc.relation.doihttps://doi.org/10.1038/s41467-022-34117-8
dc.relation.essn2041-1723
dc.rights.licenseCC BY 4.0 Unported
dc.rights.urihttps://creativecommons.org/licenses/by/4.0
dc.subject.ddc500
dc.subject.ddc530
dc.subject.ddc540
dc.subject.otherSurfaceseng
dc.subject.otherinterfaces and thin films Ultrafast photonicseng
dc.titleOptoelectronic properties and ultrafast carrier dynamics of copper iodide thin filmseng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccess
wgl.contributorPDI
wgl.subjectPhysikger
wgl.subjectChemieger
wgl.typeZeitschriftenartikelger
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