Laser-induced spatially-selective tailoring of high-index dielectric metasurfaces

Abstract

Optically resonant high-index dielectric metasurfaces featuring Mie-type electric and magnetic resonances are usually fabricated by means of planar technologies, which limit the degrees of freedom in tunability and scalability of the fabricated systems. Therefore, we propose a complimentary post-processing technique based on ultrashort (= 10 ps) laser pulses. The process involves thermal effects: crystallization and reshaping, while the heat is localized by a high-precision positioning of the focused laser beam. Moreover, for the first time, the resonant behavior of dielectric metasurface elements is exploited to engineer a specific absorption profile, which leads to a spatially-selective heating and a customized modification. Such technique has the potential to reduce the complexity in the fabrication of non-uniform metasurface-based optical elements. Two distinct cases, a spatial pixelation of a large-scale metasurface and a height modification of metasurface elements, are explicitly demonstrated. © 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

Description
Keywords
high-index dielectric metasurfaces, Mie-type, dielectric metasurface elements
Citation
Berzinš, J., Indrišiūna, S., Fasold, S., Steinert, M., Žukovskaja, O., Cialla-May, D., et al. (2020). Laser-induced spatially-selective tailoring of high-index dielectric metasurfaces. 28(2). https://doi.org//10.1364/OE.380383
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License
OSA Open Access Publishing Agreement