Laser-induced spatially-selective tailoring of high-index dielectric metasurfaces

dc.bibliographicCitation.firstPage1539eng
dc.bibliographicCitation.issue2eng
dc.bibliographicCitation.journalTitleOptics express : the international electronic journal of opticseng
dc.bibliographicCitation.lastPage1553eng
dc.bibliographicCitation.volume28eng
dc.contributor.authorBerzinš, Jona
dc.contributor.authorIndrišiūna, Simonas
dc.contributor.authorFasold, Stefan
dc.contributor.authorSteinert, Michael
dc.contributor.authorŽukovskaja, Olga
dc.contributor.authorCialla-May, Dana
dc.contributor.authorGečys, Paulius
dc.contributor.authorBäumer, Stefan M.B.
dc.contributor.authorPertsch, Thomas
dc.contributor.authorSetzpfandt, Frank
dc.date.accessioned2021-11-30T08:18:02Z
dc.date.available2021-11-30T08:18:02Z
dc.date.issued2020
dc.description.abstractOptically resonant high-index dielectric metasurfaces featuring Mie-type electric and magnetic resonances are usually fabricated by means of planar technologies, which limit the degrees of freedom in tunability and scalability of the fabricated systems. Therefore, we propose a complimentary post-processing technique based on ultrashort (= 10 ps) laser pulses. The process involves thermal effects: crystallization and reshaping, while the heat is localized by a high-precision positioning of the focused laser beam. Moreover, for the first time, the resonant behavior of dielectric metasurface elements is exploited to engineer a specific absorption profile, which leads to a spatially-selective heating and a customized modification. Such technique has the potential to reduce the complexity in the fabrication of non-uniform metasurface-based optical elements. Two distinct cases, a spatial pixelation of a large-scale metasurface and a height modification of metasurface elements, are explicitly demonstrated. © 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreementeng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/7562
dc.identifier.urihttps://doi.org/10.34657/6609
dc.language.isoengeng
dc.publisherWashington, DC : Soc.eng
dc.relation.doihttps://doi.org/10.1364/OE.380383
dc.relation.essn1094-4087
dc.rights.licenseOSA Open Access Publishing Agreementeng
dc.rights.urihttps://www.osapublishing.org/library/license_v1.cfmeng
dc.subject.ddc530eng
dc.subject.otherhigh-index dielectric metasurfaceseng
dc.subject.otherMie-typeeng
dc.subject.otherdielectric metasurface elementseng
dc.titleLaser-induced spatially-selective tailoring of high-index dielectric metasurfaceseng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccesseng
wgl.contributorIPHTeng
wgl.subjectPhysikeng
wgl.typeZeitschriftenartikeleng
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