"YESvGaN" - Vertical GaN on Silicon: Wide Band Gap Power at Silicon Cost; Teilvorhaben AIXTRON SE, Herzogenrath: "300 mm MOCVD Process"

Sachbericht zum Verwendungsnachweis

dc.contributor.authorBeer, Sebastian
dc.contributor.authorHahn, Herwig Utz
dc.contributor.authorAnders, Thorsten
dc.contributor.authorHeuken, Michael
dc.date.accessioned2026-05-18T08:59:37Z
dc.date.available2026-05-18T08:59:37Z
dc.date.issued2025
dc.description.abstract[no abstract available]ger
dc.description.versionpublishedVersion
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/36761
dc.identifier.urihttps://doi.org/10.34657/35829
dc.language.isoger
dc.publisherHannover : Technische Informationsbibliothek
dc.relation.affiliationAIXTRON SE
dc.rights.licenseCreative Commons Attribution-NonDerivs 3.0 Germany
dc.subject.ddc000 | Informatik, Information und Wissen, allgemeine Werke
dc.title"YESvGaN" - Vertical GaN on Silicon: Wide Band Gap Power at Silicon Cost; Teilvorhaben AIXTRON SE, Herzogenrath: "300 mm MOCVD Process"ger
dc.title.subtitleSachbericht zum Verwendungsnachweis
dc.typeReport
dcterms.event.date01.05.2021-31.10.2024
dcterms.extent24 Seiten
dtf.funding.funderBMFTR
dtf.funding.program16MEE0178
dtf.funding.verbundnummer01233465
tib.accessRightsopenAccess

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