Epitaxial growth of the first two members of the Ban +1InnO2.5 n +1Ruddlesden-Popper homologous series

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Date
2022
Volume
40
Issue
6
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Publisher
New York, NY : American Institute of Physics
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Abstract

We demonstrate the epitaxial growth of the first two members, and the n = ∞ member of the homologous Ruddlesden-Popper series of Ba n + 1 In n O 2.5 n + 1 of which the n = 1 member was previously unknown. The films were grown by suboxide molecular-beam epitaxy where the indium is provided by a molecular beam of indium-suboxide [In 2O (g)]. To facilitate ex situ characterization of the highly hygroscopic barium indate films, a capping layer of amorphous SiO 2 was deposited prior to air exposure. The structural quality of the films was assessed by x-ray diffraction, reflective high-energy electron diffraction, and scanning transmission electron microscopy.

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Keywords
Air-exposure, Capping layer, Ex situ, Homologous series, Molecular-beam epitaxy, Ruddlesden-Popper, Ruddlesden-Popper series, SiO 2, Situ characterization, Structural qualities
Citation
Hensling, F. V. E., Smeaton, M. A., Show, V., Azizie, K., Barone, M. R., Kourkoutis, L. F., & Schlom, D. G. (2022). Epitaxial growth of the first two members of the Ban +1InnO2.5 n +1Ruddlesden-Popper homologous series. 40(6). https://doi.org//10.1116/6.0002205
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CC BY 4.0 Unported