Behaviour of rf sputter deposited SiO2 and AI2O3 diffusion barriers on float glass at 300 °C in air

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Date
1993
Volume
66
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Journal
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Publisher
Offenbach : Verlag der Deutschen Glastechnischen Gesellschaft
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Abstract

In order to study the resistance of high-frequency sputtered thin SiO2 and AI2O3 coatings on float glass to sodium diffusion, coated glasses were submitted to heat treatments in air. The element distribution in the coatings and in the substrates was measured with neutral primary beam-secondary ion mass spectrometry.

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Chaissac, M., Claus, J., Borchardt, G., Slowik, J., Frischat, G. H., Scherrer, S., & Weber, S. (1993). Behaviour of rf sputter deposited SiO2 and AI2O3 diffusion barriers on float glass at 300 °C in air. 66.
License
CC BY 3.0 DE