CMOS-Compatible Silicon Photonic Sensor for Refractive Index Sensing Using Local Back-Side Release

Abstract

Silicon photonic sensors are promising candidates for lab-on-a-chip solutions with versatile applications and scalable production prospects using complementary metal-oxide semiconductor (CMOS) fabrication methods. However, the widespread use has been hindered because the sensing area adjoins optical and electrical components making packaging and sensor handling challenging. In this work, a local back-side release of the photonic sensor is employed, enabling a separation of the sensing area from the rest of the chip. This approach allows preserving the compatibility of photonic integrated circuits in the front-end of line and metal interconnects in the back-end of line. The sensor is based on a micro-ring resonator and is fabricated on wafer-level using a CMOS technology. We revealed a ring resonator sensitivity for homogeneous sensing of 106 nm/RIU. © 1989-2012 IEEE.

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Citation
Steglich, P., Bondarenko, S., Mai, C., Paul, M., Weller, M. G., & Mai, A. (2020). CMOS-Compatible Silicon Photonic Sensor for Refractive Index Sensing Using Local Back-Side Release (New York, NY : IEEE). New York, NY : IEEE. https://doi.org//10.1109/LPT.2020.3019114
License
CC BY 4.0 Unported