Perfluoroalkylfullerenes

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Date
2015
Journal Title
Journal ISSN
Volume Title
Publisher
Washington, DC : ACS Publ.
Abstract

New chemical derivatives that possess the greatest variety of addition patterns than any other class of fullerene derivatives represent an important addition to the existing classes of perfluorocarbons, that is, compounds that are composed only of the two types of atoms, carbon and fluorine. These include aromatic and aliphatic perfluorocarbons such as perfluorodecalin, perfluorononane, hexafluorobenzene, etc., which are important as fluorous solvents used in medicine. The propensity of perfluoroalkylfullerenes (PFAFs) to readily crystallize from organic solutions upon slow evaporation in open air provided a straightforward access to their molecular structures via X-ray crystallography. Another crucial aspect that ensures future success in the characterization of numerous PFAFs of higher fullerenes and endohedral metallofullerenes is the possibility to apply HPLC methodologies to the separation of product mixtures. PFAFs, especially those of C60 and C70, are unique fullerene derivatives in terms of the number of structurally characterized derivatives with different number of RF groups and different addition patterns.

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Keywords
Chemical compounds, Crystallography, Derivatives, Fullerenes, Endohedral metallofullerenes, Fluorous solvents, Fullerene derivative, Hexafluorobenzene, Higher fullerenes, Organic solutions, Perfluoroalkylfullerenes, Perfluorodecalin, X ray crystallography, fullerene derivative, alkylation, chemistry, conformation, halogenation, isolation and purification, nuclear magnetic resonance spectroscopy, quantum theory, spectrofluorometry, X ray crystallography, Alkylation, Crystallography, X-Ray, Fullerenes, Halogenation, Magnetic Resonance Spectroscopy, Molecular Conformation, Quantum Theory, Spectrometry, Fluorescence
Citation
Citation
Boltalina, O. V., Popov, A. A., Kuvychko, I. V., Shustova, N. B., & Strauss, S. H. (2015). Perfluoroalkylfullerenes (Version publishedVersion, Vol. 115). Version publishedVersion, Vol. 115. Washington, DC : ACS Publ. https://doi.org//10.1021/cr5002595
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